Business
Fluid Control Devices
HEMMI Slide Rule provides product development, design and manufacturing of fluid control devices to meet customer’s application and usage. The products we provide are devices with excellent performance to accurately measure and control flow rate.
Valve
We provide optimal products including pressure control devices and flow rate control devices which can be used in various areas.
Uses
Usage varying from control of fine pressure and minute flow rate of analyzing equipment to semiconductor industry.
Model |
Type |
Application |
Flow range |
|---|---|---|---|
MV1000A |
Needle valve |
Control of very low gas and liquid flows |
70～6000ml/min |
CF1000A/ |
Flow control valve |
Analysis tool, etc. |
100～30000ml/min |
LC2100A |
Flow control valve for liquid |
Liquid sampling |
30～300ml/min(water) |
Model |
Type |
Application |
Set pressure |
|---|---|---|---|
RD1200A |
Ø50 Pressure reducing valve |
Analyzing equipment for gas lines |
5.88～588kPa |
RD1400A |
Ø40 Pressure reducing valve |
Analyzing equipment, gas panel measuring instrument |
5.88～588kPa |
RD1410B |
Ø40 Metal diaphragm pressure reducing valve |
High precision analyzing equipment, high temperature gas |
5.88～588kPa |
RD1500A |
Ø70 Pressure reducing valve |
Low differential pressure control in gas line |
2.94～196kPa |
RD2210A |
Ø50 Metal diaphragm pressure reducing valve |
Gas for semiconductor manufacturing, etc. |
17.15～2058kPa |
HA1100A |
Ø25 Pressure reducing valve of block type |
Specific for gas collection panel of analyzing equipment |
30～70kPa |
LR1200A |
Ø50 Water pressure reducing valve |
Sampling line (water) |
29～294kPa |
RU1400A |
Ø40 Back-pressure valve |
Gas pressure control of tank and pump |
5.88～588kPa |
RU1500A |
Ø70 Back-pressure valve |
Pressure control of tank and low pressure control (for gas) |
2.94～196kPa |
RU2210A |
Ø50 Metal diaphragm back-pressure valve |
High-purity and corrosive gas |
17.15～1372kPa |
RV2210A |
Ø50 Metal diaphragm negative pressure pressure reducing valve |
High-purity gas, corrosive gas and low vapor pressure gas |
-98～490kPa |
Mass Flow Controller
We provide various Mass Flow Controller including low-cost to high precision type, ones equipped with display unit and digital control etc.
Uses
Usage ranging from analyzing equipment to semiconductor industry.
Model |
Type |
Application |
Flow range |
|---|---|---|---|
HM1000B |
Low cost mass flow |
General industries, analyzing |
5SCCM～20SLM |
HM1400B |
Low cost mass flow |
General industries, analyzing, with 24V DC drive |
5SCCM～20SLM |
HM5000B |
General-purpose/high performance mass flow |
General industries, process |
5SCCM～400SLM |
HM5300A |
Mass flow controller |
General industries, process, with 24V DC drive |
5SCCM～400SLM |
HM5400B |
General-purpose/high performance mass flow |
General industries, process, with 24VDC drive |
5SCCM～400SLM |
HM5500A |
Digital mass flow |
General industries, process, digital control |
5SCCM～400SLM |
HM9500B |
Small size flow sensor |
Various gas flow monitoring |
5SCCM～1SLM |
PM1000B |
Flow setting indicator with power supply |
Mass flow controller |
- |
Pump
Diaphragm pump suitable for small amount of discharge such as ink.
Uses
Used for supply and collection of solvent etc.
Model |
Type |
Application |
Flow range |
|---|---|---|---|
YH1104A |
Small diaphragm pump |
Low liquid flow |
160 - 500ml/min for each type |
PD3300A01/ |
Small diaphragm pump |
Liquid |
300ml/min or 600ml/min |
PD5100A |
Small diaphragm liquid pump |
Liquid |
1000ml/min |
PD5500A |
Diaphragm air pump |
Normal air |
4.7l/min |
Heat Exchanger
Precisely controls the temperature of the fluid.
Application
For general industry, Semiconductor processes.
Model |
Type |
Application |
Flow range |
|---|---|---|---|
EH1010A |
Heat exchanger |
For general industry, |
1-10L/min |
EH1200A |
Heat exchanger |
For general industry, |
10-150L/min |
EH1300A |
Heat exchanger |
For general industry, |
50-300L/min |