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Semiconductors and Other Equipment
Metalorganic Chemical Vapor Deposition Equipment
Low Pressure Chemical Vapor Deposition Equipment
Horizontal Oxidation and Diffusion Furnace Systems
Liquid Dispensers for Semiconductor Coating
Low Pressure Chemical Vapor Deposition Equipment (LP-CVD)
Forms a polycrystalline silicon film (SiN film, poly-Si film) or an oxide film on the substrate in a low pressure reactor.
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